ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,515, issued on May 13, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate treating apparatus and substrate treating method" was invented by Miso Park (Daejeon, South Korea), Yong Hee Lee (Cheonan-si, South Korea) and Dohyeon Yoon (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides an apparatus for treating a substrate by using a supercritical fluid. In an embodiment, the apparatus may include a process chamber that provides a treatment space, and including a chamber heater that increases a temperature of an interior of the treatment space, a substrate support provided in the...