ALEXANDRIA, Va., March 5 -- United States Patent no. 12,240,259, issued on March 4, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Substrate processing device and control method for substrate processing device" was invented by Sang Min Ha (Hwaseong-si, South Korea), Hyeong Jun Cho (Seoul, South Korea), Jae Hong Kim (Asan-si, South Korea), Sang Hyun Son (Busan, South Korea) and Young-Joo Seo (Gwangju-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate processing device which includes a substrate transfer part on which a transfer object is received and a jetting system part includes an ink jet body that jets and prints ink on the transfer object over an upper sur...