ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,983, issued on June 24, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).

"Apparatus for treating substrate and method for treating substrate" was invented by Dong-Hun Kim (Seoul, South Korea), Wan Jae Park (Hwaseong-si, South Korea), Ji Hoon Park (Suwon-si, South Korea) and Du Ri Kim (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having an inner space; a plasma source configured to apply an electric field; a first gas supply unit configured to supply a first process gas to a region to which the plasma sour...