US Patent Issued to SEMES on June 17 for "Cleaning unit, substrate processing apparatus including the same, and head cleaning method" (South Korean Inventor)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,330,420, issued on June 17, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Cleaning unit, substrate processing apparatus including the same, and head cleaning method" was invented by Hahn Seok Jeon (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a head unit including a head having at least one nozzle for ejecting a treatment liquid to a substrate and a cleaning unit that cleans the head, wherein the cleaning unit includes a first cleaning member that sprays a cleaning liquid to the head; and a second cleaning member that ...