ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,370, issued on June 17, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea).
"Apparatus and method for treating substrate" was invented by Sangmin Lee (Seoul, South Korea), Woo Young Kim (Cheonan-si, South Korea), Joo Jib Park (Asan-si, South Korea) and Boong Kim (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are an apparatus and a method for treating a substrate at a high-pressure atmosphere. The apparatus for treating the substrate includes a first body and a second body combined with each other to define a treatment space in which the substrate is treated, a sealing member interposed between the first...