ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,735, issued on June 10, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Apparatus and method for processing substrate" was invented by Seong Gil Lee (Gyeonggi-do, South Korea), Sehoon Oh (Chungcheongnam-do, South Korea), Dong Sub Oh (Busan, South Korea), Ji-Hwan Lee (Gyeonggi-do, South Korea), Dong-Hun Kim (Seoul, South Korea) and Wan Jae Park (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus and method for processing a substrate using plasma, which has high plasma stability and process reproducibility, is provided. The method includes providing an apparatus for processing a substrate comprising ...