ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,889, issued on July 8, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea).
"Apparatus for processing a substrate and method of processing a substrate" was invented by Muhyeon Lee (Cheonan-si, South Korea), Inryu Jeon (Cheonan-si, South Korea) and Yeonju Lee (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for processing a substrate may include a drain box for receiving a solution drained in a predetermined process, a drain line for discharging the solution from the drain box to an outside, and at least one spray member for providing a gas and/or a liquid to block an air flowed into the drain box and/or to con...