US Patent Issued to SEMES on July 22 for "Apparatus for correcting photomask and method thereof" (South Korean Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,799, issued on July 22, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).

"Apparatus for correcting photomask and method thereof" was invented by Hyo Won Yang (Seoul, South Korea), Hyun Yoon (Gyeonggi-do, South Korea), Ji Hoon Jeong (Gyeonggi-do, South Korea), In Ki Jung (Gyeonggi-do, South Korea), Ki Hoon Choi (Chungcheongnam-do, South Korea), Tae Hee Kim (Gyeonggi-do, South Korea) and Se Hoon Oh (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask correction method capable of increasing the photomask precision is provided. The photomask correction method comprises measuring an intensity profile ...