ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,675, issued on Jan. 28, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea).
"Apparatus for treating substrate and method for treating a substrate" was invented by Ji Hun Kim (Pohang-si, South Korea) and Hyung Joon Kim (Pyeongtaek-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space for treating a substrate; a support unit configured to support the substrate at the treating space; and a plasma source for generating a plasma from a process gas supplied into the treating space; an exhaust line connec...