ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,688, issued on Jan. 20, was assigned to Semes Co. Ltd. (Cheonan-si, South Korea).

"Supporting device and apparatus for processing a substrate including a supporting device" was invented by Yonghee Lee (Cheonan-si, South Korea), Sangmin Lee (Seoul, South Korea), Euisang Lim (Cheonan-si, South Korea) and Dohyeon Yoon (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process may be performed on the substrate, and a supporting device contacting the process chamber and supporting the process chamber. The suppor...