ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,150, issued on Feb. 3, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).
"Substrate processing apparatus and method thereof" was invented by Ick Kyun Kim (Gyeonggi-do, South Korea) and Sung Hun Eom (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus capable of effectively removing contaminants in an edge region of a substrate. The substrate processing apparatus comprises: a support configured to rotate a substrate; a first bath installed around the support and configured to store a cleaning liquid and form a first opening on an upper surface thereof; and a first ultrason...