ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,516, issued on Feb. 18, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate treating apparatus and substrate treating method" was invented by Jae Oh Bang (Seoul, South Korea), Young Seo An (Gyeonggi-do, South Korea), Seung Han Lee (Chungcheongnam-do, South Korea), Seung Hwan Lee (Chungcheongnam-do, South Korea) and Hyun Min Kim (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept relates to a substrate treating apparatus including a process chamber having a first and a second body, a support unit supporting a substrate, a heating unit heats the substrate, a driver moves any one of the...