US Patent Issued to SEMES on Feb. 18 for "Substrate processing apparatus and substrate processing method using same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,227,838, issued on Feb. 18, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Substrate processing apparatus and substrate processing method using same" was invented by Ban Seok You (Seoul, South Korea), Woo Seok Jang (Gyeonggi-do, South Korea), Min Jung Choi (Gyeonggi-do, South Korea) and Ki Duk Tak (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate is provided. The method processes a substrate by using a substrate processing apparatus including a chamber, a shower head unit for supplying a cleaning gas into the chamber, a first electrode disposed on an upper portion of the shower...