ALEXANDRIA, Va., Feb. 12 -- United States Patent no. 12,221,296, issued on Feb. 11, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate processing apparatus and method" was invented by Ho Chul Choi (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus and method capable of controlling a gripper to stably suck a substrate even when the substrate is deformed, the substrate processing apparatus including a floating stage for floating a substrate, lift pins liftably mounted in the floating stage, a substrate aligner for aligning the substrate floated from the floating stage, a gripper for vacuum-sucking the aligned substrate, ...