ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,494,382, issued on Dec. 9, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Method and apparatus for treating substrate" was invented by Ki-Moon Kang (Yongin-si, South Korea), Hyun Goo Park (Seongnam-si, South Korea) and Hyo Won Yang (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a high pressure chamber configured to form a treating space for performing a supercritical treating process therein; a substrate support unit configured to support a substrate at the treating space; a fluid supply unit configured to supply...