ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,530, issued on Dec. 2, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Method and apparatus for treating substrate, and temperature control method" was invented by Myung Hwan Oh (Gyeonggi-do, South Korea), Sung Yong Lee (Gyeonggi-do, South Korea), Dong Hyuk Seo (Gyeonggi-do, South Korea) and Young Un Yun (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a method of treating a substrate, the method including: performing a first heating process of heat-treating the substrate formed with a film, and a second heating process of heat-treating the substrate after the first heatin...