ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,488,998, issued on Dec. 2, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Apparatus and method for processing substrate" was invented by Jin Woo Jung (Cheonan-si, South Korea), Do Hyeon Yoon (Cheonan-si, South Korea) and Yong Hee Lee (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a substrate cleaning unit cleaning a substrate, a substrate drying unit drying the substrate, and a transfer robot transferring the substrate between the substrate cleaning unit and the substrate drying unit. The substrate drying unit includes a substrate processing container having a substrate proces...