ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,110, issued on Dec. 16, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Substrate processing apparatus" was invented by Junseok Park (Cheonan-si, South Korea), Chulho Jung (Pyeongtaek-si, South Korea) and Jongjoon Jeon (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus. The substrate processing apparatus includes a support plate configured to support a substrate, a base plate under the support plate, a thermal insulation layer between the support plate and the base plate, and a bonder bonding the base plate and the thermal insulation layer to each other, wherein the thermal...