ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,381,084, issued on Aug. 5, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea).
"Apparatus and method for treating substrate" was invented by Hyun Yoon (Hwaseong-si, South Korea), Ki Hoon Choi (Cheonan-si, South Korea), Tae Hee Kim (Yongin-si, South Korea), Hyo Won Yang (Seoul, South Korea), Young Dae Chung (Incheon, South Korea) and Ji Hoon Jeong (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a mask treating apparatus. The mask treating apparatus includes a support unit configured to support and rotate a mask, the mask having a first pattern within a plurality of cells thereof and a se...