ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,918, issued on Aug. 12, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Substrate processing apparatus and substrate processing method" was invented by Minyoung Kim (Chungcheongnam-do, South Korea) and Hanglim Lee (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus and substrate processing method capable of processing a substrate by using plasma, the substrate processing apparatus including a process chamber providing an internal space where a substrate is processed, a spin chuck serving as a lower electrode, supporting the substrate in the internal space of th...