ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,543, issued on April 8, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).
"Apparatus for treating substrate and method for treating substrate" was invented by Yong Hyun Choi (Cheonan-si, South Korea), Young Hun Lee (Cheonan-si, South Korea), Seung Hoon Oh (Cheonan-si, South Korea), Mi So Park (Daejeon, South Korea), Tae Jong Choi (Anyang-si, South Korea), Yong Sun Ko (Suwon-si, South Korea) and Jin Woo Jung (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a method for treating a substrate. The method for treating a substrate comprises: treating the substrate with liquid; and drying...