US Patent Issued to SEMES on April 15 for "Substrate processing apparatus and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,276,025, issued on April 15, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).

"Substrate processing apparatus and substrate processing method" was invented by Kwang Ryul Kim (Chungcheongnam-do, South Korea), Yun Sang Kim (Chungcheongnam-do, South Korea) and Jin Hee Hong (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a processing chamber having a processing space in which a substrate is plasma-processed, and having a transparent window; a gas flow unit supplying and discharging process gas to the processing chamber; and a laser irradiator irradiating a laser for heat...