ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,119, issued on April 15, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Apparatus for treating substrate" was invented by Myung Seok Cha (Seoul, South Korea), Sang Min Lee (Seoul, South Korea), Jin Woo Jung (Cheonan-si, South Korea) and Do Hyeon Yoon (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing an inner space; a fluid supply unit configured to supply a treating fluid to the inner space; and a fluid exhaust unit configured to exhaust the treating fluid from the inner space, and wherein the ...