ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,008, issued on Oct. 14, was assigned to SEIKO EPSON Corp. (Tokyo).
"Projection system and projector" was invented by Hitoshi Hirano (Suwa, Japan), Hirotaka Yanagisawa (Azumino, Japan) and Akihisa Kageyama (Matsumoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A projection system includes a first lens group, an aperture diaphragm, and a second lens group. A reduction side of the second lens group is telecentric. The first lens group includes a first sub-lens group having negative power and a second sub-lens group having positive power. Between a lens located at the most reduction side of the first sub-lens group and a lens located at the mo...