ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,011, issued on Nov. 25, was assigned to SEIKO EPSON Corp. (Japan).

"Radiation curable ink jet composition and ink jet method" was invented by Naoki Koike (Matsumoto, Japan), Toru Saito (Yamagata, Japan), Kyohei Tanaka (Matsumoto, Japan) and Kiyoshi Nakamura (Matsumoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radiation curable ink jet composition includes polymerizable compounds and a photopolymerization initiator, the polymerizable compounds include a monofunctional monomer, a content of the monofunctional monomer with respect to a total mass of the polymerizable compounds is 90 percent by mass or more, and the photopolymerization ini...