US Patent Issued to Seiko Epson on June 17 for "Maintenance liquid and maintenance method" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,142, issued on June 17, was assigned to Seiko Epson Corp. (Tokyo).

"Maintenance liquid and maintenance method" was invented by Keitaro Nakano (Matsumoto, Japan), Chigusa Sato (Shiojiri, Japan) and Mitsuaki Yoshizawa (Minowa-machi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided a maintenance liquid, which is used in maintenance of a device equipped with a discharge head for discharging an ultraviolet ray curable-type composition containing the acyl phosphine oxide-based photopolymerization initiator toward an attachment object, including a polymerizable compound in which a saturation solubility of an acyl phosphine oxide-based...