ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,504, issued on April 29, was assigned to SEIKO EPSON Corp. (Tokyo).

"Interference filter, and method of manufacturing interference filter" was invented by Tomoki Sakashita (Shiojiri, Japan) and Teruyuki Nishimura (Matsumoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An interference filter includes a transmissive first substrate including a first inner surface and a first outer surface facing each other, in which the first inner surface is provided with a first reflection film, a transmissive second substrate including a second inner surface and a second outer surface facing each other, in which the second inner surface is provided with a s...