ALEXANDRIA, Va., March 19 -- United States Patent no. 12,254,906, issued on March 18, was assigned to SEAGATE TECHNOLOGY LLC (Fremont, Calif.).
"Planarization strategy in nano-sized fabrication" was invented by Cheng Bi (Shakopee, Minn.), Zhiguo Ge (Edina, Minn.), Shaun E McKinlay (Eden Prairie, Minn.) and Minzhen Cai (Eden Prairie, Minn.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of planarizing a device having a surface topography with at least one material at a surface of the device is described. The method comprises the steps of depositing a stop layer over at least a portion of the at least one material which substantially retains the surface topography of the device. A sacrificial layer is ...