US Patent Issued to SCREEN Semiconductor Solutions on Feb. 4 for "Substrate treating apparatus with parallel first and second parts of substrate treatment lines on multiple stories for simultaneously treating a plurality of substrates" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,986, issued on Feb. 4, was assigned to SCREEN Semiconductor Solutions Co. Ltd. (Kyoto, Japan).

"Substrate treating apparatus with parallel first and second parts of substrate treatment lines on multiple stories for simultaneously treating a plurality of substrates" was invented by Hiroyuki Ogura (Kyoto, Japan), Tsuyoshi Mitsuhashi (Kyoto, Japan), Yoshiteru Fukutomi (Kyoto, Japan), Kenya Morinishi (Kyoto, Japan), Yasuo Kawamatsu (Kyoto, Japan) and Hiromichi Nagashima (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically f...