US Patent Issued to SCREEN Holdings on Sept. 16 for "Substrate treating method and substrate treating apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,930, issued on Sept. 16, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate treating method and substrate treating apparatus" was invented by Wataru Yano (Kyoto, Japan) and Takayuki Nishida (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate treating method for performing cleaning treatment to a substrate by contacting a brush against the substrate. The method includes a rotating step of rotating a spin holder, holding the substrate, around a vertical shaft axis, an outer periphery edge contacting step of contacting the brush against the substrate at an outer periphery edge contacting position closer to a...