US Patent Issued to SCREEN Holdings on Sept. 16 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,931, issued on Sept. 16, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate processing apparatus and substrate processing method" was invented by Rikuta Aoki (Kyoto, Japan), Daijo Mizukami (Kyoto, Japan) and Tomoaki Aihara (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a processing liquid tank, a first circulation pipe, a filter, a pump, and a controller. The first circulation pipe has an upstream end connected to the processing liquid tank and a downstream end connected to the processing liquid tank. A processing liquid circulates in the first circulation pipe. The filter is deposed...