ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,634, issued on Oct. 28, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate processing apparatus" was invented by Hajime Nishide (Kyoto, Japan), Kwichang Kang (Kyoto, Japan) and Takao Matsumoto (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a substrate processing apparatus (1), above a plurality of processing parts (31) arrayed in an up-and-down direction, arranged are a plurality of collecting pipes (61a to 61c). The plurality of collecting pipes (61a to 61c) correspond to a plurality of fluid classifications, respectively. Further, provided are a plurality of exhaust pipes (4) extending upward from the plurality of proces...