ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,344, issued on Oct. 21, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).
"Substrate processing method" was invented by Noritake Sumi (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method according to this invention includes supporting a substrate having a liquid film on an upper surface substantially in a horizontal posture by placing the substrate on a flat plate-like support tray, accommodating the support tray into an internal space of a chamber and sealing the internal space, introducing a gas which is pressurized toward a gap space between a lower surface of the support tray and a bottom surface of the inte...