ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,063, issued on Nov. 4, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).
"Substrate cleaning device" was invented by Takuma Takahashi (Kyoto, Japan), Tomoyuki Shinohara (Kyoto, Japan), Junichi Ishii (Kyoto, Japan), Kazuki Nakamura (Kyoto, Japan), Takashi Shinohara (Kyoto, Japan), Nobuaki Okita (Kyoto, Japan) and Yoshifumi Okada (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning device includes a substrate holder, a lower-surface brush, a first liquid nozzle and a second liquid nozzle. The substrate holder holds a substrate in a horizontal attitude. The lower-surface brush is configured to be movable between a processing...