US Patent Issued to SCREEN Holdings on Nov. 25 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,478,997, issued on Nov. 25, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing method and substrate processing apparatus" was invented by Yuji Okita (Kyoto, Japan), Hideji Naohara (Kyoto, Japan), Hiroaki Kakuma (Kyoto, Japan), Tatsuya Masui (Kyoto, Japan) and Yuichi Deba (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method includes: a holding step of carrying a substrate into an inside of a chamber and holding said substrate; a supply step of supplying a fluid to the substrate on the inside of the chamber; an imaging step of sequentially imaging the inside of the chamber by a camera to ac...