US Patent Issued to SCREEN Holdings on Nov. 18 for "Substrate treating apparatus and substrate treating method" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,118, issued on Nov. 18, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate treating apparatus and substrate treating method" was invented by Shigeru Yamamoto (Kyoto, Japan), Takashi Akiyama (Kyoto, Japan), Daiki Fujii (Kyoto, Japan) and Kenji Edamitsu (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treating apparatus includes a process tank for storing a treatment liquid, a chamber for surrounding the process tank, a solvent vapor nozzle for supplying solvent vapor into the chamber, a cleaning liquid nozzle for supplying a cleaning liquid, and a controller. The controller causes immersion treatment, where a substra...