US Patent Issued to SCREEN Holdings on Nov. 18 for "Substrate processing condition setting method, substrate processing method, substrate processing condition setting system, and substrate processing system" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,124, issued on Nov. 18, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate processing condition setting method, substrate processing method, substrate processing condition setting system, and substrate processing system" was invented by Sei Negoro (Kyoto, Japan), Kensuke Shinohara (Kyoto, Japan) and Masahiro Tokuyama (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing condition setting method includes acquiring, causing, and setting. In the acquiring, a plurality of estimation processing results are acquired by inputting a plurality of processing conditions to a trained model that is subjected to machine tra...