US Patent Issued to SCREEN Holdings on Nov. 11 for "Substrate treatment method and substrate treatment device" (Japanese Inventors)

ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,465,955, issued on Nov. 11, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate treatment method and substrate treatment device" was invented by Toru Endo (Kyoto, Japan), Hideji Naohara (Kyoto, Japan), Yuji Okita (Kyoto, Japan), Katsuei Higashi (Kyoto, Japan), Takahiro Yamaguchi (Kyoto, Japan), Ryuta Tsukahara (Kyoto, Japan) and Akira Ishimaru (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method includes a substrate holding step of holding a substrate at a holding position surrounded by a cylindrical guard, a processing liquid supplying step of supplying a processed surface of the substrate with a pr...