US Patent Issued to SCREEN Holdings on May 6 for "Substrate processing apparatus and monitoring method in substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,293,492, issued on May 6, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and monitoring method in substrate processing apparatus" was invented by Shinji Shimizu (Kyoto, Japan), Ryo Yamada (Kyoto, Japan), Tatsuya Masui (Kyoto, Japan), Yuichi Deba (Kyoto, Japan) and Miwa Miyawaki (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus collectively processes a plurality of substrates with the plurality of substrates immersing in a processing liquid. The substrate processing apparatus includes a processing tank, a camera, and a controller. The processing tank stores the processi...