US Patent Issued to SCREEN Holdings on May 20 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,261, issued on May 20, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and substrate processing method" was invented by Akira Ito (Kyoto, Japan) and Takahiro Yamaguchi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A light emitting element is positioned at a position right below one principal surface of a substrate rotating about an axis of rotation and away from an end surface of the substrate toward the axis of rotation. The light emitting element is arranged as to be inclined from a horizontal plane so that the light emitting surface faces a peripheral edge part of the substrate. Light emitte...