ALEXANDRIA, Va., June 16 -- United States Patent no. 12,308,258, issued on May 20, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing apparatus and substrate processing method" was invented by Tomohiro Takahashi (Kyoto, Japan), Takuya Kishida (Kyoto, Japan), Masayuki Orisaka (Kyoto, Japan) and Kei Takechi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "At least part of a processing liquid upward flowing in a storage space is split into a plurality of upflows and guided to a substrate held by a substrate holder. Many upflows are widely dispersed and formed in the processing liquid stored in the storage space, and the generation of downflows in the storage space is suppressed....