US Patent Issued to SCREEN Holdings on March 18 for "Substrate cleaning device and substrate cleaning method" (Japanese Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,251,735, issued on March 18, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate cleaning device and substrate cleaning method" was invented by Kazuki Nakamura (Kyoto, Japan), Junichi Ishii (Kyoto, Japan), Tomoyuki Shinohara (Kyoto, Japan) and Takuma Takahashi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate is held in a horizontal attitude by a substrate holder. At a processing position, a lower surface of the substrate held by the substrate holder is cleaned by a lower-surface brush. The lower-surface brush is cleaned by a brush cleaner at a waiting position that overlaps with the substrate held by the substrate holde...