ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,600, issued on June 3, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Substrate treatment apparatus, substrate treatment method, substrate treatment system, and learning data generation method" was invented by Hideji Naohara (Kyoto, Japan), Takashi Ota (Kyoto, Japan), Takashi Ikeuchi (Kyoto, Japan) and Yasunori Nakamura (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treatment apparatus includes a nozzle, a moving mechanism, a storage portion, and a control portion. The learned model is generated by learning, as learning data, learning target speed information indicating a moving speed of the nozzle and the amount ...