ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,586, issued on June 3, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate cleaning method and substrate processing method" was invented by Koji Nishiyama (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning method includes holding and rotating a substrate by a rotation holder and cleaning a back surface of the substrate held by the rotation holder. The holding and rotating the substrate includes holding the substrate by a holder provided at a rotator and rotating the rotator about a rotation axis. The cleaning includes moving a cleaning tool by a mover while pressing the cleaning tool against the back surface of...