ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,737, issued on June 10, was assigned to SCREEN Holdings Co. Ltd. (Japan).

"Substrate treating apparatus" was invented by Jun Sawashima (Kyoto, Japan), Takahiro Yamaguchi (Kyoto, Japan), Toshimitsu Namba (Kyoto, Japan) and Sei Negoro (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treating apparatus includes a treating housing and a gas supply unit. The treating housing treats substrates in the interior thereof. The gas supply unit supplies a gas to the interior of the treating housing. The gas supply unit has a filter, a duct, and a fan. The filter is located in an upper part of the treating housing. The filter blows off the...