US Patent Issued to SCREEN Holdings on July 15 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,199, issued on July 15, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing method and substrate processing apparatus" was invented by Kei Suzuki (Kyoto, Japan) and Masaki Inaba (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The substrate processing method includes a liquid film forming step of forming a liquid film of a sulfuric acid-containing liquid on a principal surface of a substrate, an ozone-containing gas exposing step of filling an ozone-containing gas inside a processing chamber capable of housing the substrate to expose the liquid film to the ozone-containing gas, and a substrate heating step of h...