US Patent Issued to SCREEN Holdings on Jan. 28 for "Substrate treatment apparatus and substrate treatment method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,687, issued on Jan. 28, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate treatment apparatus and substrate treatment method" was invented by Shigeru Yamamoto (Kyoto, Japan), Daiki Fujii (Kyoto, Japan), Keiji Iwata (Kyoto, Japan), Kenji Edamitsu (Kyoto, Japan), Yuya Kawai (Kyoto, Japan) and Kenichi Ito (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol t...