ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,708, issued on Jan. 28, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing apparatus and substrate processing method" was invented by Shuichi Yasuda (Kyoto, Japan) and Kenji Kobayashi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "First and second concentration measurement parts (415, 425) are provided in first and second supply liquid lines (412, 422) in which first and second supply liquids flow, respectively. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second supply liquid lines, respective one ends of first and second branch lines ...