US Patent Issued to SCREEN Holdings on Jan. 28 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,197, issued on Jan. 28, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and substrate processing method" was invented by Hideji Naohara (Kyoto, Japan) and Hiroaki Kakuma (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus processes a substrate. The substrate processing apparatus includes at least one processing unit that processes the substrate, first and second cameras that image different subject areas, and an association processing unit that generates association information indicating association between each of the subject areas and each of the first and second c...