ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,753, issued on Jan. 27, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate processing apparatus" was invented by Yosuke Yasutake (Kyoto, Japan) and Ryo Muramoto (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "In a substrate processing apparatus for supplying a processing liquid onto a substrate being rotated, to thereby process the substrate, an upper support body which is a placement member is separably placed on a lower support body for supporting the substrate. The upper support body is moved up and down by an up-and-down moving part. The upper support body includes a first contact part outside an outer periphery of the sub...